TECHNICAL MECHANICS
ISSN (Print): 1561-9184, ISSN (Online): 2616-6380

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UDC 621.002.56

Technical mechanics, 2019, 4, 137 - 147

DEVELOPMENT AND STUDY OF A PROTOTYPE LOW-FREQUENCY POWER SOURCE FOR A HIGH-CURRENT PULSED MAGNETRON DISCHARGE

DOI: https://doi.org/10.15407/itm2019.04.137

Gryshkevych O. D., Hryniuk S. I.

Gryshkevych O. D.
Institute of Technical Mechanics of the National Academy of Sciences of Ukraine and the State Space Agency of Ukraine

Hryniuk S. I.
Institute of Technical Mechanics of the National Academy of Sciences of Ukraine and the State Space Agency of Ukraine

      This paper addresses the problem of the development of a discharge power source compatible with plasma magnetron-type process devices with an unbalanced magnetic system. The aim of the work was to develop a circuit for magnetron discharge voltage modulation based on inexpensive electron components. Consideration is given to possibilities of implementing a package surface treatment technology using a pulsed flow of an energetic gas–metal plasma generated by an anomalous glow discharge with closed electron drift.
      The applicability of two discharge voltage modulation circuits based on an inductive/capacitive energy storage system was studied. A resonance modulation circuit with charging voltage doubling was chosen. The circuit makes it possible to generate discharge pulses of width up to 10 ms and power up to 20–30 kW at a pulse repetition rate up to 100 Hz. The discharge voltage was switched using type Ò161-160-16 thyristors. The parameters of the modulation circuits under study were tried out together with a prototype integrated magnetron plasma device with a planar and a cylindrical magnetron sputtering system of the unbalanced and the balanced type, respectively.
      The operating parameter range of a high-current pulsed magnetron discharge voltage source was determined. Plasma parameters in the surface treatment area were studied. The metal ion content of the generated plasma was determined. Coatings with characteristics exceeding those obtained using a steady magnetron discharge were deposited. The plasma process deice studied in this work allows one to execute all process steps of ion-plasma treatment in a single vacuum cycle.
      It is concluded that the pulsed discharge source circuit developed meets the requirements for the deposition of functional nanostructured metal coatings and is suitable for high-intensity low-energy nitrogen ion implantation.
     

physical vapor deposition, high-intensity low-energy ion deposition, high-current pulsed magnetron discharge, planar magnetron sputtering system, cylindrical magnetron sputtering system, pulsed discharge power source

1. Stepanova T. Yu. Technologies of Machine Component Surface Strengthening. Ivanovo: Ivanovo State University of Chemistry and Technology, 2009. 64 pp. (in Russian).

2. Sulima V. A., Shulov V. A., Yagodkin Yu. D. Machine Component Surface Layer and Service Properties. Ìoscow: Mashinostroyeniye, 1988. 240 pp. (in Russian).

3. Panin V. E., Sergeev V. P., Panin A. V. Nanostructuring of Strucrural Material Surface Layers and Nanostructured Coating Deposition. Tomsk: Tomsk Polytechnic University, 2010. 254 pp. (in Russian).

4. Svadkovsky I. V. Lines of the development of magnetron sputtering systems (in Russian). Doklady BGUIR. 2007. No. 2(18). Pp. 112-121.

5. Granovsky V. L. Electric Current in a Gas. Steady-State Current. Moscow: Nauka, 1971. 543 pp.

6. Mozgrin D. V., Fetisov I. K., Khodachenko G. V. Experimental study of high-current forms of a low-pressure quasi-steady discharge in a magnetic field, Fizika Plazmy. 1995. V. 21. No. 5. Pp. 422-433.

7. Aksenov I. I., Andreeev A. A., Belous A. et al. Vacuum Arc. Plasma Sources, Coating Deposition, and Surface Modification (in Russian). Kyiv: Naukova Dumka, 2012. 727 pp.

8. Kadyrzhanov K. K. Ion-Beam and Ion-Plasma Material Modification. Moscow: Moscow State University, 2005. 640 p.

9. Sochugov N. S., Oskirko V. O., Spirin R. E. A power supply for magnetron sputtering systems. Instruments and Experimental Techniques. 2013. V. 56. No. 2. Pp. 178-184. https://doi.org/10.1134/S0020441213010302

10. Kuzmichev A. I. Pulse magnetron sputtering systems. Proceedings of the ISTFE-14 Kharkiv Scientific Assembly. Kharkiv: NNTs KhFTI, 2014. Pp. 221-244. (in Russian).

11. Optical Quantum Generators. Moscow: Sovetskoye Radio. 1972. 408 pp. (in Russian).

12. Vakulenko V. M. Some features of the oscillatory charge of a capacitive energy storage system. Zhurnal Prokladnoi Spektroskopii. 1969. V. XI. No. 3. Pp. 456-464. (in Russian).

DOI: https://doi.org/10.15407/itm2019.04.137

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